New micro and nanotechnology development plant, Innofab located in Cerdanyola del Vallés (Barcelona).
The new plant will include a clean room of more than 2,000 m2 dedicated to the development of innovative micro and nanotechnologies based on advanced semiconductors (“beyond-CMOS”). The project includes the construction of three different buildings: the FAB building, distributed over four floors of approximately 2,650 m2 each, an office and laboratory building of approximately 7,300 m2 and an auxiliary services building of approximately 4,000 m2, which will house the main energy generation and distribution systems for the rest of the buildings.

• Built area 22,051 m2